Devices · 1h ago
Intel First to Use High-NA EUV for High-Volume Chip Production
Intel has become the first company to use ASML's High-NA EUV lithography tools for high-volume manufacturing, patterning select layers of its upcoming Panther Lake processors on the 18A node. The tools, with a 0.55 numerical aperture, enable finer features critical for next-generation chips. This milestone positions Intel as a leader in advanced semiconductor manufacturing, ahead of rivals like TSMC and Samsung.
Meridian48 take
While a notable technical first, Intel still faces yield and cost challenges in scaling High-NA EUV across all layers and products.
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Intel becomes the first company to ship high-volume logic chips made with ASML's High NA EUV — select Panther Lake layers on 18A are now dual-qualified for 0.55 NA scanners →
Tom's Hardware
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